New
Ohring's Materials Science of Thin Films,
Edition 3 Deposition and StructureEditors: By Tomas Kubart, Kostas Sarakinos, Ph.D.,Physics, RWTH Aachen University, Germany, Grégory Abadias, Panos Patsalas and Daniel Gall
Publication Date:
01 Aug 2027
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Ohring's Materials Science of Thin Films: Deposition and Structure, Third Edition is an ideal resource for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films as well as scientists and engineers who are entering the field or require an overview of thin films. The book provides the most comprehensive coverage of materials science and technology related to thin films and coatings of any book, bringing the most important advances made since the publication of the previous edition. All chapters have been fully revised and include new illustrations, examples, and exercises.
Key Features
- Contains fully updated content including coverage of the latest and most important deposition techniques such as atomic layer deposition and high impulse magnetron sputtering
- Provides new or expanded coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth
- Includes fully updated illustrations, new examples, and fully revised and expanded end-of-chapter problems
About the author
By Tomas Kubart, Department of Engineering Sciences, Uppsala University, Uppsala, Sweden; Kostas Sarakinos, Ph.D.,Physics, RWTH Aachen University, Germany, Nanoscale Engineering, Linköping University, Sweden; Grégory Abadias, Physics Department, University of Poitiers, France; Panos Patsalas, Physics Department, Aristotle University of Thessaloniki, Greece and Daniel Gall, Associate Professor, Rensselaer Polytechnic Institute, Troy, NY, USA
1. Introduction to Thin Films
2. Vacuum Science and Technology
3. Thin-Film Evaporation Processes
4. Discharges, Plasmas, and Ion-Surface Interactions
5. Plasma and Ion Beam Processing of Thin Films
6. Chemical Vapor Deposition
7. Substrate Surfaces and Thin-Film Nucleation
8. Epitaxy
9. Film Structure
10. Characterization of Thin Films and Surfaces
11. Interdiffusion, Reactions, and Transformations in Thin Films
12. Mechanical Properties of Thin Films
2. Vacuum Science and Technology
3. Thin-Film Evaporation Processes
4. Discharges, Plasmas, and Ion-Surface Interactions
5. Plasma and Ion Beam Processing of Thin Films
6. Chemical Vapor Deposition
7. Substrate Surfaces and Thin-Film Nucleation
8. Epitaxy
9. Film Structure
10. Characterization of Thin Films and Surfaces
11. Interdiffusion, Reactions, and Transformations in Thin Films
12. Mechanical Properties of Thin Films
ISBN:
9780128225400
Page Count:
784
Retail Price
:
Upper level undergraduate and graduate students in materials science, chemical and electrical engineering (In the US, thin film courses are taught at approximately 50 engineering schools, with 800 enrolled students annually)
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